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1

[Japan Society of Applied Physics Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Yokohama, Japan (6-8 July 1999)] Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay

Eun-Mi Lee,, Moon-Gyu Sung,, Young-Mi Lee,, Young-Soo Sohn,, Hye-Keun Oh,

Year:

1999

Language:

english

File:

PDF, 145 KB

english, 1999

2

Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity

Kim, In-Seon, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.27 MB

english, 2016

3

Advanced Lithography Simulation for Various 3-Dimensional Nano/Microstructuring Fabrications in Positive- and Negative-Tone Photoresists

Kim, Sang-Kon, Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2011

Language:

english

File:

PDF, 4.22 MB

english, 2011

4

[Japan Soc. Appl. Phys Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (11-13 July 2000)] Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) - Effect of temperature variation during post exposure bake on 193 nm chemically amplified resist simulation

Young-Soo Sohn,, Dong-Soo Sohn,, Hye-Keun Oh,

Year:

2000

Language:

english

File:

PDF, 141 KB

english, 2000

5

Mask three-dimensional effects of etched multilayer mask for 16-nm half-pitch in extreme ultraviolet lithography

Kim, Guk-Jin, Kim, In-Seon, Yeung, Michael, Oh, Hye-Keun

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 1.47 MB

english, 2016

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Panning, Eric M., Goldberg, Kenneth A., Hwang, Jeong-gu, Kim, In-Seon, Kim, Guk-Jin, No, Hee-Ra, Kim, Byung-Hun, Oh, Hye-Keun

Year:

2017

Language:

english

File:

PDF, 2.14 MB

english, 2017

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Panning, Eric M., Goldberg, Kenneth A., Kim, Guk-Jin, Kim, In-Seon, Yeung, Michael, Kim, Min-Su, Park, Jin-Goo, Oh, Hye-Keun

Year:

2017

Language:

english

File:

PDF, 870 KB

english, 2017

8

Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction

Lee, Sung-Gyu, Kim, Guk-Jin, Kim, In-Seon, Ahn, Jin-Ho, Park, Jin-Goo, Oh, Hye-Keun

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 1.49 MB

english, 2015

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

Panning, Eric M., Goldberg, Kenneth A., Ko, Ki-Ho, Mo, Soo-Yeon, Kim, In-Seon, Oh, Hye-Keun

Year:

2016

Language:

english

File:

PDF, 1.22 MB

english, 2016

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

La Fontaine, Bruno M., Kim, Eun-Jin, You, Jee-Hye, Kim, Seoung-Sue, Cho, Han-Ku, Ahn, Jinho, An, Ilsin, Oh, Hye-Keun

Year:

2010

Language:

english

File:

PDF, 2.76 MB

english, 2010

11

Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle

Ko, Ki-Ho, Mo, Soo-Yeon, Kim, In-Seon, Oh, Hye-Keun

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.03 MB

english, 2016

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Embedded micro/nano channel formation for three-dimensional negative-tone photoresist microstructuring

Kim, Sang-Kon, Henderson, Clifford L., Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

Year:

2009

Language:

english

File:

PDF, 730 KB

english, 2009

13

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Reflow modeling for elongated contact hole shape

Lee, Ji-Eun, Lin, Qinghuang, Kim, Dai-Gyoung, Kim, Kang Baek, Jung, Mi-Rim, Kang, Hye-Young, Kim, Jong-Sun, Hong, Joo-Yoo, Oh, Hye-Keun, Park, Jun-Tack

Year:

2006

Language:

english

File:

PDF, 316 KB

english, 2006

14

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Photoresist adhesion effect of resist reflow process

Park, Joon-Min, Lee, Ji-Eun, Kim, Moon-Seok, Kim, Jung-Hun, Kim, Jai-Soon, Lee, Sung-Muk, Park, Jun-Tack, Bok, Chul-Kyu, Moon, Seung-Chan, Park, Seung-Wook, Hong, Joo-Yoo, Oh, Hye-Keun, Lin, Qinghuang

Year:

2007

Language:

english

File:

PDF, 511 KB

english, 2007

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Feasibility of a new absorber material for high NA extreme ultraviolet lithography

Panning, Eric M., Goldberg, Kenneth A., Ko, Ki-Ho, Oh, Hye-Keun

Year:

2016

Language:

english

File:

PDF, 790 KB

english, 2016

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

Panning, Eric M., Goldberg, Kenneth A., Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Year:

2017

Language:

english

File:

PDF, 2.28 MB

english, 2017

17

Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents

Kim, Min-Su, Purushothaman, Muthukrishnan, Kim, Hyun-Tae, Song, Hee-Jin, Kim, Young-Woong, Ahn, Jin-Ho, Oh, Hye-Keun, Park, Jin-Goo

Journal:

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Year:

2018

Language:

english

File:

PDF, 1.79 MB

english, 2018

18

Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations

Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Journal:

Microelectronic Engineering

Year:

2017

Language:

english

File:

PDF, 1.48 MB

english, 2017

19

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Temperature rising effect of 193-nm chemically amplified resist during postexposure bake

Lee, Young-Mi, Sung, Moon-Gyu, Lee, Eun-Mi, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 456 KB

english, 2000

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Heat behavior of extreme-ultraviolet pellicle including mesh support

Kim, In-Seon, Naulleau, Patrick P., Kim, Eun-Jin, Kim, Ji-Won, Oh, Hye-Keun

Year:

2013

Language:

english

File:

PDF, 432 KB

english, 2013

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - A study of the effect of pellicle support structures on aerial-image quality in EUV lithography by rigorous electromagnetic simulation

Wood, Obert R., Panning, Eric M., Yeung, Michael S., Barouch, Eytan, Oh, Hye-Keun

Year:

2014

Language:

english

File:

PDF, 561 KB

english, 2014

22

[IEEE Digest of Papers Microprocesses and Nanotechnology 2005. 2005 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (2005.10.25-2005.10.28)] Digest of Papers Microprocesses and Nanotechnology 2005 - Reticle haze measurement by spectroscopic ellipsometry

Young-Hoon Kim,, Sung-Hyuck Kim,, Sung-un Kim,, Jin-Back Park,, Jal-Sun Kyoung,, Il-Sin An,, Hye-Keun Oh,

Year:

2005

Language:

english

File:

PDF, 646 KB

english, 2005

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Stress-induced pellicle analysis for extreme-ultraviolet lithography

Panning, Eric M., Goldberg, Kenneth A., Park, Eun-Sang, Kim, Min-Ha, Hwang, Sollee, Kim, Jung Hwan, Oh, Hye-Keun

Year:

2016

Language:

english

File:

PDF, 696 KB

english, 2016

24

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Proximity effects for rinse, dry, and etch parameters

Kim, Sang-Kon, Tanabe, Hiroyoshi, Oh, Hye-Keun, Kim, Ho Seob

Year:

2003

Language:

english

File:

PDF, 130 KB

english, 2003

25

Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation

Park, Juhae, Lee, Sung-Gyu, Vesters, Yannick, Severi, Joren, Kim, Myungwoong, De Simone, Danilo, Oh, Hye-Keun, Hur, Su-Mi

Journal:

Year:

2019

Language:

english

File:

PDF, 3.94 MB

english, 2019

26

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Simple 157-nm interference illumination system for pattern formation

Park, Seung-Wook, Smith, Bruce W., Jeong, Jang-hwan, Choi, Jung-wook, Oh, Hye-keun, Kim, Jaesoon, Park, Inho

Year:

2004

Language:

english

File:

PDF, 367 KB

english, 2004

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system

Panning, Eric M., Goldberg, Kenneth A., Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun

Year:

2016

Language:

english

File:

PDF, 897 KB

english, 2016

28

Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL)

Hafeez, Hassan, Ryu, Heon-Yul, An, Il Sin, Oh, Hye-Keun, Ahn, Jin-Ho, Park, Jin-Goo

Journal:

Microelectronic Engineering

Year:

2015

Language:

english

File:

PDF, 1.86 MB

english, 2015

29

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - The effect of transmission reduction by reticle haze formation

Kim, Sung-Jin, Archie, Chas N., Kyoung, Jai-Sun, Park, Jin-Back, Kim, Young-Hoon, Park, Seung-Wook, An, Il-Sin, Oh, Hye-Keun

Year:

2006

Language:

english

File:

PDF, 402 KB

english, 2006

30

Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process

Park, Joon-Min, Kang, Young-Min, Hong, Joo-Yoo, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 203 KB

english, 2008

31

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Modification of development parameters of 193-nm chemically amplified resist with pattern density

Seo, Eun-Jung, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Woo, Sang-Gyun, Seong, Nakgeuon, Cho, Hanku, Houlihan, Francis M.

Year:

2001

Language:

english

File:

PDF, 283 KB

english, 2001

32

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Soft bake effect in 193-nm chemically amplified resist

Sung, Moon-Gyu, Lee, Young-Mi, Lee, Eun-Mi, Sohn, Young-Soo, An, Ilsin, Oh, Hye-Keun, Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 284 KB

english, 2000

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

Cho, In Wook, Park, Joon-Min, Kim, Hyunsu, Hong, Joo-Yoo, Kim, Seong-Sue, Cho, Han-Ku, Oh, Hye-Keun, Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 933 KB

english, 2009

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Resist reflow process for arbitrary 32 nm node pattern

Henderson, Clifford L., Park, Joon-Min, An, Ilsin, Oh, Hye-Keun

Year:

2008

Language:

english

File:

PDF, 4.22 MB

english, 2008

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Pattern deformation caused by deformed pellicle with ArF exposure

You, Jee-Hye, Dusa, Mircea V., Conley, Will, An, Ilsin, Oh, Hye-Keun

Year:

2010

Language:

english

File:

PDF, 442 KB

english, 2010

36

Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node

Kim, Guk-Jin, Kim, In-Seon, Lee, Sung-Gyu, Yeung, Michael, Kim, Min-Su, Park, Jin-Goo, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 3.49 MB

english, 2017

37

Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system

Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Kim, Seong-Wook, Oh, Hye-Keun

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 2.57 MB

english, 2016

38

Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: I. Numerical Approach

Kim, Do Wan, Lee, Ji-Eun, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 665 KB

english, 2008

39

SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Etched multilayer mask is better than conventional absorber mask

Kato, Kokoro, Kim, Guk-Jin, Oh, Hye-Keun, Kim, In-Seon, Yeung, Michael, Barouch, Eytan

Year:

2014

Language:

english

File:

PDF, 517 KB

english, 2014

40

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask

Kang, Young-Min, Watanabe, Hidehiro, Kim, Sung-Jin, Park, Jin-Back, Chang, Wook, Park, Seung-Wook, Kim, Jai-Soon, Cho, Han-Koo, Oh, Hye-Keun

Year:

2007

Language:

english

File:

PDF, 469 KB

english, 2007

41

[Japan Soc. Appl. Phys Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference - Tokyo, Japan (6-8 Nov. 2002)] 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. - Process proximity correction by using neural networks

Kyoung-Ah Jeon,, Ji-Yong Yoo,, Jun-Taek Park,, Hyeongsoo-Kim,, Ilsin An,, Hye-Keun Oh,

Year:

2002

Language:

english

File:

PDF, 86 KB

english, 2002

42

The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method

Kim, Hyoung-Hee, Park, Jun-Tack, Choi, Jung-Wook, An, Ilsin, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 145 KB

english, 2004

43

Resist Reflow Process for 32 nm Node Arbitrary Pattern

Park, Joon-Min, An, Ilsin, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 492 KB

english, 2009

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Kim, Eun-Jin, Schellenberg, Frank M., La Fontaine, Bruno M., You, Jee-Hye, Kim, Seong-Sue, Cho, Han-Ku, An, Ilsin, Oh, Hye-Keun

Year:

2009

Language:

english

File:

PDF, 887 KB

english, 2009

45

Thermal analysis of extreme ultraviolet pellicle with metallic coatings

Park, Eun-Sang, Kim, Min-Ha, Hwang, Sollee, Oh, Hye-Keun

Journal:

Microelectronic Engineering

Year:

2017

Language:

english

File:

PDF, 1.10 MB

english, 2017

46

Which Mask is Preferred for Sub-60 nm Node Imaging?

Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2007

Language:

english

File:

PDF, 543 KB

english, 2007

47

32 nm Half Pitch Formation with High-Numerical-Aperture Single Exposure

Jung, Minhee, Park, Joon-Min, Oh, Hye-Keun

Journal:

Japanese Journal of Applied Physics

Year:

2009

Language:

english

File:

PDF, 319 KB

english, 2009

48

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Simulation of mask induced polarization effect on imaging in immersion lithography

Kwak, Eun-A, Flagello, Donis G., Jung, Mi-Rim, Kim, Dai-Gyoung, Lee, Ji-Eun, Oh, Hye-Keun

Year:

2006

Language:

english

File:

PDF, 295 KB

english, 2006

49

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask

You, Jee-Hye, Chen, Alek C., Lin, Burn, Kang, Young-Min, Jung, Minhee, Yen, Anthony, Oh, Hye-Keun

Year:

2008

Language:

english

File:

PDF, 270 KB

english, 2008

50

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - Simulation benchmarking for the whole resist process

Kim, Sang-Kon, Tobin, Jr., Kenneth W., Lee, Ji-Eun, Park, Seung-Wook, Yoo, Ji-Yong, Oh, Hye-keun

Year:

2004

Language:

english

File:

PDF, 610 KB

english, 2004

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